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MITAKA / RYOKOSHA
 

Features
8-inch wafer ideal for quality control for large, high density semiconductor products such as lead frames
  • Ideal for quality control for large, high density semiconductor products
  • Range of measurement (X,Y,Z)=(250,200,10)mm
    Optional: Z=110mm



MITAKA / RYOKOSHA
 

Features
  • Makes high-precision measurement of large, heavy-weight objects in portal structures possible
  • Range of measurement (X,Y,Z)=(300,400,120)mm
    Optional: Z=170mm
 


MITAKA / RYOKOSHA
 

Features
  • LCD patterns
  • Direct measurement of large aspherical mirrors
  • Range of measurement (X,Y,Z)=(400,500,170)mm


A device for comprehensive evaluation from manufacturing to imaging performance
NH-3N Standard system in the NH Series combining superior functionality with high cost performance
Stitching measurement technology making ƒÊm measurement of concavity of 60° or more
NH-3SP High precision version with maximum measurement precision and resolution
NH-4N Ideal for quality control of high density and increasingly large semiconductor products such as 8-inch wafers and lead frames
NH-5N Makes high-precision measurement of large, heavy-weight goods such as precision molds with portal structures
NH-6N Direct measurement of LCD patterns, large aspherical mirrors, etc.


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